The HMPS-2080SP microwave plasma CVD equipment is a multi-purpose, high-performance comprehensive experimental and industrial equipment suitable for the preparation of high-quality diamond and a variety of carbon-based materials, which provides a 2-inch diamond material growth capacity.
. Adopt the third-generation high-stability solid-state power source of Wattsine; New generation of large-volume cylindrical water-cooled discharge cavit
. Advanced performance, safety, strong reliability, good reproducibility and easy operation.
. Multi-parameter real-time monitoring, acquisition and recording, PLC screen control, multiple interlock protection.
| （1） | Model | HMPS-2080SP |
| （2） | Power supply | AC380±10% V three-phase five-wire system 50Hz, rated input <10KVA |
| （3） | Microwave output power | 0.5~8kW continuously adjustable |
| （4） | Power stability | better than 1% |
| （5） | Ripple | ≤1% |
| （6） | Microwave frequency | 2450MHz±50MHz |
| （7） | Temperature measurement method | infrared 300~1400℃ |
| （8） | Ultimate vacuum | ≤3.7×10-3Torr |
| （9） | Working pressure | 5torr~225torr |
| （10） | Discharge zone | Φ≥70mm |
| （11） | uniform deposition zone | ≥68mm |
| （12） | Working atmosphere | H2 /CH4 /N2 /O2 or CO2 or Ar, expandable to 5 channels |
| （13） | Helium mass spectrometry vacuum leakage rate | ≤1.0×10-9Pa·m3/s； |
| （14） | Working environment temperature | 15-40℃, relative humidity ≤60%, no corrosive gas |
Bulk growth of high-quality single crystal diamond and polycrystalline diamond.
CVD preparation of various thin films, surface treatment and modification of materials, growth of low-temperature oxides, etc.
It is suitable for the industrial production of optics, electronics, tool-grade diamond film or single crystal, graphene, etc., material surface treatment, low-temperature oxide growth, etc.
