Plasma cleaning and etching field
Plasma cleaning and etching field

Plasma etching includes microwave electron cyclotron resonance plasma etching (ECR), reaction ion etching (RIE) and inductive coupled plasma etching (ICP)...

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Plasma cleaning Plasma etching(ECR)
Plasma cleaning

Plasma cleaning technology provides the best prerequisites for the subsequent spraying process of plastic, metal, aluminum or glass.

The dry atmospheric plasma cleaning technology can be used for subsequent processing immediately after the cleaning is completed. This application will ensure the cleanliness and low cost of the entire process. Because plasma has a high energy, it can selectively decompose the chemical or organic substances on the surface of the material. With ultra-fine cleaning, even harmful substances on sensitive surfaces can be completely removed. This prepares the best prerequisites for the subsequent coating process.


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