WSRPS-2450-3K-C1 solid-state microwave remote plasma source(RPS) system introduces the leading German plasma technology, which mainly designed with AC-DC power supply, 3kW solid-state microwave generator, remote plasma chamber, microwave transmission waveguide and isolator.

The RPS generates excited gases in the plasma chamber, which leave the RPS as uncharged radicals. The uncharged radicals are introduced into the process reactor and etch the semiconductor wafers there without damaging the integrated circuit Provide high concentration, low temperature and more uniform active radicals, effectively control the reaction uniformity and reduce contamination. It is a better solution for dry treatment of semiconductor materials.