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HMPS-2150S microwave plasma CVD equipment

Hueray Microwave, a subsidiary of Wattsine, specializes in the research and development of microwave energy, microwave plasma application technology and the production of MPCVD equipment. It has a number of independent intellectual property rights... This type of microwave plasma produced by us is HMPS-2060P. This equipment has the following advantages:

. New design of microwave reaction chamber with high power density.

. The product has a fast deposition rate, high deposition quality, and a deposition area of more than 3 inches.

. Switch type microwave power source, high stability of microwave power output.

. Advanced performance, safety, strong reliability, good reproducibility and easy operation.

. Multi-parameter real-time monitoring, acquisition and recording, PLC screen control, multiple interlock protection and alarm.

Technical Index


(2)Power supply

AC380±10% V three-phase five-wire system 50Hz, rated input <10KVA

(3)Microwave output power

0.5~6kW continuously adjustable

(4)Power stability

better than 2%




Microwave frequency  

(7)Temperature measurement method
infrared 300~1400℃

Ultimate vacuum degree


Working pressure  


Sample table


Axial adjustment range of the sample stage


Working atmosphere

Five-way (customizable)

Microwave leakage value


Working environment temperature

15-40℃, relative humidity ≤60%, no corrosive gas

Cooling water



It is suitable for the deposition of optical, electronic, tool-grade diamond film or single crystal, graphene, etc., material surface treatment, low-temperature oxide growth, etc.

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