Hueray Microwave, a subsidiary of Wattsine, specializes in the research and development of microwave energy, microwave plasma application technology and the production of MPCVD equipment. It has a number of independent intellectual property rights... This type of microwave plasma produced by us is HMPS-2060P. This equipment has the following advantages:
. New design of microwave reaction chamber with high power density.
. The product has a fast deposition rate and high deposition quality.
. Switch type microwave power supply, high stability of microwave output.
. Advanced performance, safety, strong reliability, good reproducibility and easy operation.
. Multi-parameter real-time monitoring, acquisition and recording, PLC screen control, multiple interlock protection.
| （1） | Model | HMPS-2060S |
| （2） | Power supply | AC380±10% V three-phase five-wire system 50Hz, rated input <10KVA |
| （3） | Microwave output power | 0.5~6kW continuously adjustable |
| （4） | Power stability | better than 2% |
| （5） | Ripple | ≤1% |
| （6） | Microwave frequency | 2450MHz±50MHz |
| （7） | Temperature measurement method | infrared 300~1400℃ |
| （8） | Ultimate vacuum degree | 6×10-6torr |
| （9） | Working pressure | 7torr~250torr |
| （10） | Sample table | Φ60mm |
| （11） | Axial adjustment range of the sample stage | 0-60mm |
| （12） | Working atmosphere | Five-way (customizable) |
| （13） | Microwave leakage value | ＜5mW/cm2 |
| （14） | Working environment temperature | 15-40℃, relative humidity ≤60%, no corrosive gas |
| （15） | Cooling water | ＞22L/Min |
It is suitable for the deposition of optical, electronic, tool-grade diamond film or single crystal, graphene, etc., material surface treatment, low-temperature oxide growth, etc.
